ETHNA System, funded by the EU´s Horizon 2020 research and innovation programme, has just published the first of three guides on defining and measuring society´s most pressing needs and demands. As soon as the other guides are finalised, you can find them here as well.
As engaging stakeholders is key to define and measure societal needs, the guide “Mapping stakeholders and scoping involvement – A guide for HEFRCs” develops strategies that support RRI. Authored by project partner EUREC, the European Network of Research Ethics Committees, this first guide “can serve as a concrete roadmap for engaging stakeholders from a wide range of societal groups who are willing to participate in a dialogue on ethical governance” as Lisa Häberlein, main author of the guide, explains.
You can download the guide here.
The second guide “Stakeholder involvement in ethical governance of R&I – A guide for HEFRCs” has just been published. It provides institutions wishing to implement an ETHNA System with methodological guidance for participatory stakeholder engagement in R&I governance. The guide outlines a range of options and illustrative examples for conducting deliberative workshops with key actors whether from research, innovation and funding communities, business and industry, policy makers or civil society.
You can download the guide here.
Finally, “Gauging the potential societal contributions of research and innovation – a guide for HEFRCs” has been published. It highlights how higher education, funding and research centres can monitor and respond to societal needs. The third guide provides guidance on how organisations can identify societal needs and address them in RRI activities to meet today’s most pressing demands. It also provides methodological examples as well as insight on the implementation of deliberative workshos to address society´s most pressing needs.
You can download the guide here.
These deliverables have not yet been reviewed by the European Commission. Its content might therefore change as a result of the review process.